Induced damage during STEM-EELS analyses on acrylic-based materials for Stereolithography

(Scanning) transmission electron microscopy, (S)TEM, offers a powerful characterization tool based on electron-matter interactions, highly valuable in materials science. However, the possible beam induced damage during (S)TEM measurements hinders analysis of soft materials, such as acrylic resins. Importantly, resins offer an appealing playground for development novel composites with customized properties and convenient processing capabilities 3D-printing technologies, including Stereolithography (SLA). There are several factors preventing optimal performance TEM applied to resins, among which we focus quality analyzed specimen (i.e., compromise between thickness robustness, achieve transparency while keeping material integrity), particularly challenging when working materials; electrostatic charging/discharging effects, resulting sample drift related noise/artefacts; radiolysis knock-on electron-induced damage, directly degrade under study. We explore compare different methodologies obtain resin specimens suitable analysis, employed subsequent study electron–beam STEM-EELS measurements. Furthermore, propose likely underlying mechanisms explaining degradation EELS monitored signals. On one hand, assess evolution carbon oxygen content, well thinning function accumulated dose. other extract meaningful information from spectral shape K-edges upon increasing doses, unraveling pathways. The earned understanding electron-beam determination critical doses provide useful framework implementation techniques tools help smart engineering acrylic-based SLA.